Parameters study in ICP-RIE and Fabrication of Sealed Micro-Channels

碩士 === 國立交通大學 === 機械工程系 === 89 === Two subjects are performed in this paper. First, systematical experiments are designed to study the fabrication parameters in Advanced Silicon Etch (ASE) process. Second, an improved fabrication process of sealed micro-channel is carried out with the STS...

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Bibliographic Details
Main Authors: Hsiang-Chi Liu, 劉祥麒
Other Authors: Wensyang Hsu
Format: Others
Language:en_US
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/61973838984749082007