Finite Element Methods for the Boltzmann Transport Equation

碩士 === 國立交通大學 === 應用數學系 === 89 === In the process of ion implantation, ions are implanted into the semiconductor by means of a high-energy ion beam. The energetic ions lose their energy through collisions with electrons and nuclei in the substrate such as silicon and finally come to rest....

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Bibliographic Details
Main Authors: Kuei-Ling Lin, 葉桂菱
Other Authors: Jinn-Liang Liu
Format: Others
Language:en_US
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/55711632859994660399