Fingering Instability and Reduction of Photoresist Usage

博士 === 國立中央大學 === 機械工程研究所 === 89 === To reduce the photoresist usage and understand the film spreading process, this study performs flow visualization experiments and numerical simulations. This thesis is the first work to show that in the early stage of the spin coating process, the spreading of ph...

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Bibliographic Details
Main Authors: Ming-Wen Wang, 王明文
Other Authors: Fu-Chu Chou
Format: Others
Language:en_US
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/32661520847028629108