Applications of Anisotropic Etching On Silicon Substrate : Si-molding and Si V-grooves
碩士 === 國立中山大學 === 機械工程學系研究所 === 89 === The objective of this thesis is to apply semiconductor etching process technologies on 6 inch P-type Si substrate and produce a mold of Light Guiding Plate (LGP). After evaporate chromium (Cr) onto the Si substrate as etch mask, the thin films were then pattern...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/58732143413743275541 |