Effects of Stress on the Formation of Nickel Silicides on Silicon-on-Insulator (SOI) Wafers
碩士 === 國立清華大學 === 材料科學工程學系 === 89 === The effects of stress on the formation of nickel silicides on SOI (silicon-on-insulator) wafers have been investigated by sheet resistance measurements, glancing-angle x-ray diffraction analysis and transmission electron microscopy. Tensile...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/31794220600972068170 |