The study of growth and surface morphology of nickel silicide films by EM and AFM
碩士 === 國立清華大學 === 材料科學工程學系 === 89 === The effects of different film thickness and annealing time on the formation of nickel silicides in nickel thin film on silicon have been investigated. NiSi and epitaxial NiSi2 were found to form in Ni (30 nm) / (001) Si samples after anneal...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/71221998833246302119 |