A study of nanoporous silica of low dielectric constant materials for ULSI applications
碩士 === 國立清華大學 === 材料科學工程學系 === 89 === Abstract Among various low-k materials, spin-on-glass (SOG) materials have been widely used as an interlayer dielectric in multilevel interconnections because of their ease of application and relatively low process costs. Porous materials are promisin...
Main Authors: | Li-te Chao, 趙立德 |
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Other Authors: | Han C Shih |
Format: | Others |
Language: | en_US |
Published: |
2001
|
Online Access: | http://ndltd.ncl.edu.tw/handle/06579644858380640381 |
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