Characteristics of RF-Sputtered Tantalum oxynitride-Ta(N,O) Films
博士 === 國立清華大學 === 材料科學工程學系 === 89 === In this study, the tantalum oxynitride-Ta(N,O) films were prepared by RF magnetron sputtering. By tuning the sputtering parameters, such as RF power, substrate temperatures, sputtering gas ratios such as like the N2/O2 flow ratio and the Ar fraction (...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/72018645216306591733 |