Study of Anti-Reflective Coatings for Deep Ultraviolet Photomask and Photoresists for Sub-100 nm Generation Electron Beam Direct Writing Applications
碩士 === 國立清華大學 === 原子科學系 === 89 === There are two major parts in this thesis. One is establishing the anti-reflective coatings technique for using in deep ultraviolet photomask. The other is to investigate the behavior of DUV photoresists for applying in electron beam direct writing system....
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/01628748885775596799 |