The Relationship between Wear and Mechanical Properties of The CMP Pad
碩士 === 國立清華大學 === 動力機械工程學系 === 89 === Pad, consumable product of CMP is one of most important factor in the polishing process. Until now, pad is dependent on import. No domestic manufacturer has this technology and nobody really understand the characteristics of pad. All of the pad information, like...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52864879799381948729 |