Study of Multi-Layer Bottom Antireflective Coatings and Substrate Contamination Effects in Deep UV Lithography

碩士 === 國立海洋大學 === 光電科學研究所 === 89 === We propose a new multi-layer bottom antireflective coating (BARC) structure for deep-UV lithography. The mulit-layer BARC structure is composed of TEOS oxide and silicon nitride or silicon oxynitride films. The top TEOS oxide layer is a base contamination free ma...

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Bibliographic Details
Main Authors: Hsieh Cheng Feng, 謝境峰
Other Authors: 施明昌
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/79398812115918523933