Study on Synthesis and Lithographic Performance of Deep UV Photoresist
博士 === 國立臺灣大學 === 化學工程學研究所 === 89 === The thesis is focused on the ArF photoresist which is the key chemicals for the next generation of integrated circuit (IC) manufacture. Polymethacrylate and Cycloolefin copolymers were synthesized for use as single layer photoresists. The effect of composition,...
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94450478885868338275 |