Study on Thickness Uniformity of Rapid Thermal Thin Gate Oxide
碩士 === 國立臺灣大學 === 電機工程學研究所 === 89 === Two main topics are discussed in this thesis. One is about the electrical characteristics of MOS capacitor with non-uniform gate oxide and the other is the uniformity improvement of gate oxide prepared by Rapid Thermal Processor(RTP). In or...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49874845421521239969 |