Effects of annealing on ITO thin film acaracteristic
碩士 === 國立臺北科技大學 === 材料及資源工程系碩士班 === 89 === The study uses DC magnetron sputtering method which ours group best processes（Ex.Deposition temperature：180℃、Deposition thickness：1000Å、O2 flow：6 sccm、magnetron field：800G and 99.99%density of ITO target） to deposited ITO thin filmson glasses. Then make Vac...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/33854866627283055807 |