Improvement in the Dielectric Properties of (Ta2O5)0.92-(TiO2)0.08 Composite Thin Films by Oxygen Plasma Treatment
碩士 === 國立雲林科技大學 === 電子與資訊工程研究所碩士班 === 89 === The effect of oxygen plasma treatment on the properties of as-deposited 1000Å thick high-dielectric thin films has been investigated. Tantalum pentoxide and Titanium dioxide composite film (Ta2O5)0.92-(TiO2)0.08 was deposited on Pt/Ta/SiO2/Si substrate by...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19091538190294169689 |