Study on Low Dielectric Constant Material For ULSI Applications
碩士 === 國立雲林科技大學 === 電子與資訊工程研究所碩士班 === 89 === Study on Low Dielectric Constant Material For ULSI Applications Student: Kai-Huang Chen Advisor : Dr. Jian-Yang Lin Dr. Ting-Chang Chang Institut...
Main Authors: | Kai-Huang Chen, 陳開煌 |
---|---|
Other Authors: | Jian-Yang Lin |
Format: | Others |
Language: | zh-TW |
Published: |
2001
|
Online Access: | http://ndltd.ncl.edu.tw/handle/49694535210136444113 |
Similar Items
-
study on low dielectric constant material in ULSI technology applications
by: Tsai Tsung Ming, et al.
Published: (2000) -
Study on Low Dielectric Constant Material Methylsilsesquioxane for ULSI Applications
by: Tsu-Hsiu Perng, et al.
Published: (1999) -
Study of Advanced Low Dielectric Constant Materials for ULSI Intermetal Dielectric Applications
by: Hsien Ming Tu, et al.
Published: (1999) -
A study of nanoporous silica of low dielectric constant materials for ULSI applications
by: Li-te Chao, et al.
Published: (2001) -
Study of SiCF-A Low Dielectric Constant Material for ULSI Application
by: chih-wei Tsai, et al.
Published: (2001)