A Multivariate Self-tuning Controller for Run-to-Run Semiconductor Manufacturing Process
碩士 === 元智大學 === 工業工程研究所 === 89 === During recent years, “Run-to-Run” (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. The R2R control methodology combines response surface modeling, engineering process control (EPC), and statistical proc...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/51333922255782880902 |