Contact Temperature Rise of Polishing Process Considering the Effects of Particle and Polishing Pad
碩士 === 國立中正大學 === 機械系 === 90 === Polishing process makes the roughness and planarity of a surface reach an admissible range and is widely used for surfaces of metal, ceramic, glass and wafer. The contact temperature plays a central role in polishing process whether the dominant effect is...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/92801687517182367368 |