Study of GaAs, InP Microlens Fabrication in Reactive Ion Etching and Application to Light Emitting Diodes
碩士 === 中原大學 === 電子工程研究所 === 90 === Abstract By transferring the reflowed spherical photoresist patterns on GaAs and InP substrate using BCl3-based reactive ion etching (RIE) to fabricate the refractive microlens was carried out. Varying etching parameters effect on the etching rate, etching selecti...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/33394091979272307452 |