The Synthesis of Nano-sized Cerium dioxide powder for Chemical Mechanical Polishing Application
碩士 === 逢甲大學 === 化學工程學所 === 90 === The developing of chemical mechanical polishing (CMP) is one key technology in CMP process. The slurry based on nano-sized cerium dioxide has been used in STI process to enhance the polishing efficiency. But the usual method in synthesizing cerium dioxide, for examp...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/05217116946996315363 |