Effect of Nitrogen Doping on the Properties of Cobalt Silicide Film ＆ Process of Micromirror
碩士 === 國立中興大學 === 電機工程學系 === 90 === This research is to investigate the properties of nitrogen-doped cobalt silicide (CoSixNy) film,including stress, sheet resistance and thermal stability. The film of 1500 Å deposited by reactive sputtering in Ar carrier gas is used in this research.With...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88601486280827411521 |