Growth characteristics and properties of transparent and conductive ZnO:Al films by reactive RF magnetron sputtering
博士 === 國立成功大學 === 材料科學及工程學系 === 90 === Transparent and conductive ZnO:Al thin films were prepared by reactive RF magnetron sputtering. The electronic conductivity was improved by controlling the deposition parameters and post-annealing treatment while the relationship between the structural characte...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/46787972681512855918 |