Properties, Structures of Zr and ZrNx Thin Films and their Applications for Diffusion Barriers By DC Magnetron Sputtering
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 90 === Abstract The main objective of this study is to assess the viability of the application of Zr and ZrNx thin films to the contact systems of current copper metallization technology as diffusion barriers. Thereby, we firstly study the dependence of the fundam...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/3rgqx4 |