Novel Positive Photosensitive Polybenzoxazole Precursors for Microelectronic Applications
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 90 === ABSTRACT Positive working, aqueous base developable photosensitive polybenzoxazole (PBO) precursors composition based on a partially trimethylsilyl (TMS) and tetrahydropyranyl (THP) protected PBO precursors and a Bisphenol A based 1,2-naphthoquinone diaz...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/23vv26 |