Computer Aided Analysis ofMagnetron Cathode in Sputtering Chamber

碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 90 === It is known that the sputter deposition technology has been widely applied in semiconductor industry. However, the problem of short cycle life of target in magnetron sputtering system has been a major issue. An inclined magnet design in magnetron cathode is...

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Bibliographic Details
Main Authors: Kang-Feng Li, 李侃峰
Other Authors: Shih-Ming Yang
Format: Others
Language:en_US
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/zue764