Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD
碩士 === 國立交通大學 === 應用化學系 === 90 === Fluorinated amorphous carbon films can be used as low dielectric constant interlayer dielectric materials. The films are deposited by using hexafluorobenzene (C6F6) as the source gas and argon as the carrier gas by PECVD.
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/58237305570333380169 |