Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD
碩士 === 國立交通大學 === 應用化學系 === 90 === Fluorinated amorphous carbon films can be used as low dielectric constant interlayer dielectric materials. The films are deposited by using hexafluorobenzene (C6F6) as the source gas and argon as the carrier gas by PECVD.
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ndltd-TW-090NCTU05000622015-10-13T10:06:55Z http://ndltd.ncl.edu.tw/handle/58237305570333380169 Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD 以六氟苯經電漿輔助化學氣相沉積非晶型低介電含氟碳膜 Wan Cheng - Yu 萬振宇 碩士 國立交通大學 應用化學系 90 Fluorinated amorphous carbon films can be used as low dielectric constant interlayer dielectric materials. The films are deposited by using hexafluorobenzene (C6F6) as the source gas and argon as the carrier gas by PECVD. Chiu Hsin—Tein Chuang Shiow—Huey 裘性天 莊琇惠 2002 學位論文 ; thesis 48 zh-TW |
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碩士 === 國立交通大學 === 應用化學系 === 90 === Fluorinated amorphous carbon films can be used as low dielectric constant interlayer dielectric materials. The films are deposited by using hexafluorobenzene (C6F6) as the source gas and argon as the carrier gas by PECVD.
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Chiu Hsin—Tein |
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Chiu Hsin—Tein Wan Cheng - Yu 萬振宇 |
author |
Wan Cheng - Yu 萬振宇 |
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Wan Cheng - Yu 萬振宇 Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD |
author_sort |
Wan Cheng - Yu |
title |
Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD |
title_short |
Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD |
title_full |
Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD |
title_fullStr |
Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD |
title_full_unstemmed |
Amorphous Low Dielectric Fluorinated Carbon Thin Film Grown from C6F6 by PECVD |
title_sort |
amorphous low dielectric fluorinated carbon thin film grown from c6f6 by pecvd |
publishDate |
2002 |
url |
http://ndltd.ncl.edu.tw/handle/58237305570333380169 |
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