A General Optimization for Slurry Injection During Chemical Mechanical Polishing
碩士 === 國立中央大學 === 機械工程研究所 === 90 === A chemical mechanical polishing model is developed In order to understand the general optimization for slurry injection position and injection rate. Slurry injection efficiency is predicted by maximum removal rate and minimum nonuniformity. We measure the mean gr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/32812041584025100296 |