The effects of Coriolis Force and Prewetting during spin coating
碩士 === 國立中央大學 === 機械工程研究所 === 90 === Spin coating is utilized widely in the microelectronics industry to form thin uniform films of photoresist, spin-on-glass, polyimide, and low dielectric constant materials on silicon wafers. This coating technique is quick and efficient. But, liquids such as phot...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/28118332390605252795 |