Laser direct writer with light intensity modulation

碩士 === 國立中央大學 === 機械工程研究所 === 90 === Traditionally, the diffractive optical element (ODE) is made by using the multiple binary-level lithography processes to enhance the diffractive efficiency. Due to the multiple exposures, the manufactory error will be included and more complicate processes is nee...

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Main Authors: Mao-feng Du, 杜茂楓
Other Authors: S. J. Chen
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/99858019108303321159
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spelling ndltd-TW-090NCU054890322015-10-13T10:12:04Z http://ndltd.ncl.edu.tw/handle/99858019108303321159 Laser direct writer with light intensity modulation 光強調變雷射書寫機之研製 Mao-feng Du 杜茂楓 碩士 國立中央大學 機械工程研究所 90 Traditionally, the diffractive optical element (ODE) is made by using the multiple binary-level lithography processes to enhance the diffractive efficiency. Due to the multiple exposures, the manufactory error will be included and more complicate processes is need to be considered. Therefore, to overcome these problems, the grey level mask can be used, in which only one exposure is needed to fabricate the optical element. This project presents that a laser machine with light intensity modulation to fabricate grey level masks. In the writer system, a solid-state laser with the power of 180 mw is used as the working light source. The processed target is laser direct write glass developed by the Canyon Material company. An acoustic-optics modulator (AOM) is used to modulate the laser intensity. To make sure the result of the processed mask, a measurement system is built. The laser direct writer system is already out of the binary methods to manufacture optical mask. The optical elements designer can use the LDW system to design any appropriate mask. Thus, the LDW system is a quite useful system for the ODEs. S. J. Chen 陳顯禎 2002 學位論文 ; thesis 66 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立中央大學 === 機械工程研究所 === 90 === Traditionally, the diffractive optical element (ODE) is made by using the multiple binary-level lithography processes to enhance the diffractive efficiency. Due to the multiple exposures, the manufactory error will be included and more complicate processes is need to be considered. Therefore, to overcome these problems, the grey level mask can be used, in which only one exposure is needed to fabricate the optical element. This project presents that a laser machine with light intensity modulation to fabricate grey level masks. In the writer system, a solid-state laser with the power of 180 mw is used as the working light source. The processed target is laser direct write glass developed by the Canyon Material company. An acoustic-optics modulator (AOM) is used to modulate the laser intensity. To make sure the result of the processed mask, a measurement system is built. The laser direct writer system is already out of the binary methods to manufacture optical mask. The optical elements designer can use the LDW system to design any appropriate mask. Thus, the LDW system is a quite useful system for the ODEs.
author2 S. J. Chen
author_facet S. J. Chen
Mao-feng Du
杜茂楓
author Mao-feng Du
杜茂楓
spellingShingle Mao-feng Du
杜茂楓
Laser direct writer with light intensity modulation
author_sort Mao-feng Du
title Laser direct writer with light intensity modulation
title_short Laser direct writer with light intensity modulation
title_full Laser direct writer with light intensity modulation
title_fullStr Laser direct writer with light intensity modulation
title_full_unstemmed Laser direct writer with light intensity modulation
title_sort laser direct writer with light intensity modulation
publishDate 2002
url http://ndltd.ncl.edu.tw/handle/99858019108303321159
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