The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
碩士 === 國立中央大學 === 光電科學研究所 === 90 === Advantage silicon nitride by CO2 laser assisted plasma enhanced chemical vapor deposition： low Si-H and N-H contained in a-SiNx:H film. Low surface roughness Prevent from moisture and oxidation Refraction index is stable Laser power will best assist at 40W. Stab...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/33445676531941039359 |