The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature

The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature

碩士 === 國立中央大學 === 光電科學研究所 === 90 === Advantage silicon nitride by CO2 laser assisted plasma enhanced chemical vapor deposition： low Si-H and N-H contained in a-SiNx:H film. Low surface roughness Prevent from moisture and oxidation Refraction index is stable Laser power will best assist at 40W. Stab...

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Bibliographic Details
Main Authors: Jia-Hung Suen, 孫嘉鴻
Other Authors: none
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/33445676531941039359
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spelling ndltd-TW-090NCU056140192015-10-13T10:12:40Z http://ndltd.ncl.edu.tw/handle/33445676531941039359 The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature 室溫沈積高穩定性之氮化矽薄膜及其光激發光譜研究 Jia-Hung Suen 孫嘉鴻 碩士 國立中央大學 光電科學研究所 90 Advantage silicon nitride by CO2 laser assisted plasma enhanced chemical vapor deposition： low Si-H and N-H contained in a-SiNx:H film. Low surface roughness Prevent from moisture and oxidation Refraction index is stable Laser power will best assist at 40W. Stable PL spectra and higher efficiency none 李清庭 2002 學位論文 ; thesis 100 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立中央大學 === 光電科學研究所 === 90 === Advantage silicon nitride by CO2 laser assisted plasma enhanced chemical vapor deposition： low Si-H and N-H contained in a-SiNx:H film. Low surface roughness Prevent from moisture and oxidation Refraction index is stable Laser power will best assist at 40W. Stable PL spectra and higher efficiency
author2 none
author_facet none
Jia-Hung Suen
孫嘉鴻
author Jia-Hung Suen
孫嘉鴻
spellingShingle Jia-Hung Suen
孫嘉鴻
The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
author_sort Jia-Hung Suen
title The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
title_short The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
title_full The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
title_fullStr The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
title_full_unstemmed The Investigation for Silicon Nitride Thin Film Deposited at Room Temperature
title_sort investigation for silicon nitride thin film deposited at room temperature
publishDate 2002
url http://ndltd.ncl.edu.tw/handle/33445676531941039359
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