Investigation of Interfacical Structures of Si3N4 on Si(100) & SI(111)
碩士 === 國立清華大學 === 材料科學工程學系 === 90 === Silicon nitride films, can be used as diffusion barrier layers, passivation layers, buffer layers, gate dielectrics, and tunneling dielectrics in microelectronic industry. Furthermore, in optoelectronics area, high quality GaN has been successfully g...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/95127670286799948819 |