TaSix Nano-Cluster Diffusion Barrier in Cu Metallization
碩士 === 國立清華大學 === 電子工程研究所 === 90 === TaSix nano-cluster thin films with a various composition of Ta and Si are fabricated in Ar gas with Ta + 1/2 Si or Ta5Si3 targets by radio frequency reactive sputtering deposition. The resistivity, chemical composition, crystalline microstructure, diff...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54244164866439175563 |