三族氮化物金屬-半導體-金屬光偵測器之製作

碩士 === 國立海洋大學 === 光電科學研究所 === 90 === In this thesis, the GaN, AlGaN, and InGaN compound semiconductors were all grown on sapphire by metalorganic chemical vapor deposition (MOCVD). And the fabricated metal-semiconductor-metal (MSM) photodetectors were compared with different parameters, including fi...

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Main Author: 林彥儒
Other Authors: 江海邦
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/72136885367547015379
id ndltd-TW-090NTOU0614003
record_format oai_dc
spelling ndltd-TW-090NTOU06140032015-10-13T10:34:09Z http://ndltd.ncl.edu.tw/handle/72136885367547015379 三族氮化物金屬-半導體-金屬光偵測器之製作 林彥儒 碩士 國立海洋大學 光電科學研究所 90 In this thesis, the GaN, AlGaN, and InGaN compound semiconductors were all grown on sapphire by metalorganic chemical vapor deposition (MOCVD). And the fabricated metal-semiconductor-metal (MSM) photodetectors were compared with different parameters, including finger width/spacing, and concentration of epitaxial layer. After thermal treatment, the characteristics of these MSM photodetectors were also investigated. The best responsivity and quantum efficiency of n-GaN (7.5E16 cm-3) MSM photodetector at 360 nm was 0.112 A/W and 38.64 % respectively while the finger width/spcing of the MSM photodetector was 2mm and operating voltage was 1V. The best responsivity and quantum efficiency of the AlGaN MSM photodetector at 350 nm were 0.127 A/W and 45 % respectively. The best responsivity of the InGaN MSM photodetector at 400 nm was 1.007 A/W. 江海邦 藍文厚 2002 學位論文 ; thesis 72 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立海洋大學 === 光電科學研究所 === 90 === In this thesis, the GaN, AlGaN, and InGaN compound semiconductors were all grown on sapphire by metalorganic chemical vapor deposition (MOCVD). And the fabricated metal-semiconductor-metal (MSM) photodetectors were compared with different parameters, including finger width/spacing, and concentration of epitaxial layer. After thermal treatment, the characteristics of these MSM photodetectors were also investigated. The best responsivity and quantum efficiency of n-GaN (7.5E16 cm-3) MSM photodetector at 360 nm was 0.112 A/W and 38.64 % respectively while the finger width/spcing of the MSM photodetector was 2mm and operating voltage was 1V. The best responsivity and quantum efficiency of the AlGaN MSM photodetector at 350 nm were 0.127 A/W and 45 % respectively. The best responsivity of the InGaN MSM photodetector at 400 nm was 1.007 A/W.
author2 江海邦
author_facet 江海邦
林彥儒
author 林彥儒
spellingShingle 林彥儒
三族氮化物金屬-半導體-金屬光偵測器之製作
author_sort 林彥儒
title 三族氮化物金屬-半導體-金屬光偵測器之製作
title_short 三族氮化物金屬-半導體-金屬光偵測器之製作
title_full 三族氮化物金屬-半導體-金屬光偵測器之製作
title_fullStr 三族氮化物金屬-半導體-金屬光偵測器之製作
title_full_unstemmed 三族氮化物金屬-半導體-金屬光偵測器之製作
title_sort 三族氮化物金屬-半導體-金屬光偵測器之製作
publishDate 2002
url http://ndltd.ncl.edu.tw/handle/72136885367547015379
work_keys_str_mv AT línyànrú sānzúdànhuàwùjīnshǔbàndǎotǐjīnshǔguāngzhēncèqìzhīzhìzuò
_version_ 1716829864542076928