The Effects of Nb2O5 and Y2O3 Additions on The TiO2 Thin Film Prepared by RF Magnetron Sputtering Method
碩士 === 國立臺北科技大學 === 材料及資源工程系碩士班 === 90 === Nb2O5 and Y2O3 additions on TiO2 thin films were deposited on glass and N-type(100) silicon substrate by RF-magnetron sputtering. The properties of films were investigated as functions of sputtering pressure, and gas flow rate. Post-deposition an...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/90637748036032933091 |