The effect of hydrogenated amorphous silicon on characteristic of thin film transistor
碩士 === 國立臺北科技大學 === 材料及資源工程系碩士班 === 90 === Abstract The influence of change different processes conditions of used PEVCD(Plasma Enhanced Chemical Vapor Deposition) system ,including hydrogen dilution ratio SiH4/H2, the power of radio frequency, different pressure of reaction room, and...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05997641022877355006 |