Research on Mechano-Chemical Planarization of Silicon Wafers

碩士 === 淡江大學 === 機械工程學系 === 90 === Brittle materials have been recognized as hard to machine and low material removal rate (MRR). Conventional approach is to apply lapping and polishing with fine abrasive machining of ductile-type or brittle type removal process. The sub-surface damage layer and resi...

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Bibliographic Details
Main Authors: Hsu, Li-Sheng, 許厲生
Other Authors: Liu, Woe-Chun
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/45524335501556878399