Optical properties of the Al2O3-ZrO2-SiO2 composite thin film for Attenuated phase-shifting mask at 193nm wavelength
碩士 === 大同大學 === 材料工程研究所 === 90 === Abstract An attenuated phase-shifting mask (APSM) used in the advance lithography technology could improve both resolution and depth of focus, and overcome the phase conflict issue incurred in a traditional phase-shifting mask. An APSM could be appl...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/24687600910618992722 |