preparations of novel polycyclosiloxanes and their applications in deep U.V. photoresist

碩士 === 國立中正大學 === 化學工程研究所 === 91 === Abstract It’s been well known that substrates containing carbon-fluoride or silicon-oxygen bonds can substantially enhance the radiation transmittance in deep U.V. light sources. Because of the high price in the organic fluoride compounds, we wish to d...

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Bibliographic Details
Main Authors: Ting Jui Hsiao, 蕭丁瑞
Other Authors: Ching Cheng Tsai
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/09842529348579786491