Deposition and Etching of Silicon Nitride Thin Films by High Density Plasma Chemical Vapor Deposition System
碩士 === 逢甲大學 === 化學工程學所 === 91 === Abstract An inductively coupled plasma chemical vapor deposition system was used to grow silicon nitride thin films. The thin films were divided into many layers by incorporating the plasma passivation in the deposition. The influences of deposition parameters, in...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60354858961608028415 |