Degradation of ZrN Films at High Temperature under Controlled Atmosphere

碩士 === 國立中興大學 === 材料工程學研究所 === 91 === The objective of this research is to investigate degradation of ZrN films annealed in the controlled atmosphere. The ZrN films were deposited onto (100) Si substrates by unbalanced magnetron sputtering. The films were then annealed in air, N2, N2/H2=9...

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Bibliographic Details
Main Authors: Wen-Zheng Lo, 羅文政
Other Authors: Fu-Hsing Lu
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/77461262579363420126