Investigation of Nanoscale Etching Process Using Molecular Dynamics Simulation

碩士 === 國立成功大學 === 工程科學系碩博士班 === 91 === The integrated circuit improve the huge electric equipment. The development of IC bring us the convenience life. Undoubtedly more and more tiny semiconductor device is the current trend. The etching process play an important role in semiconductor technology and...

Full description

Bibliographic Details
Main Authors: Huang Sheng-huang, 黃勝煌
Other Authors: Chi-Chuang Hwang
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/93874408453017506008