Growth of Hydrogen Doped Zinc Oxide Thin Film by RF Magnetron Sputtering

碩士 === 國立成功大學 === 化學工程學系碩博士班 === 91 === Radio-frequency magnetron sputtering method has been employed to deposit hydrogen doped zinc oxide. The mechanism of doping by incorporating hydrogen in zinc oxide was studied. Besides, attempts have been made to deposit at low temperature the hydrogen doped...

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Bibliographic Details
Main Authors: Chia-Chun Wang, 王家俊
Other Authors: Franklin Chau-Nan Hong
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/45215274794235642704