Growth of One-Dimensional SiOx and TiO2 Nanostructures Using Chemical Vapor Deposition

碩士 === 國立成功大學 === 化學工程學系碩博士班 === 91 === The growth characteristics of one dimensional nc-Si/SiOx composite nanowires using SiCl4/H2 as well as oxygen absorbed on chamber wall in a hot-filament chemical vapor deposition reactor were investigated in this study. The composite nanowires were grown on va...

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Bibliographic Details
Main Authors: Chi-Chung Yu, 尤啟中
Other Authors: Jih-Jen Wu
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/44011566065347659092