A Study for Reclamation and Reuse of the Chemical Mechanical Polishing Wastewater in Semi-conductor Industry

碩士 === 國立成功大學 === 環境工程學系碩博士班 === 91 === Feasibility for treatment and reclamation of the Chemical Mechanical Polishing(CMP) wastewater by the Latin Square Design and Taguchi Method of experiment design were studied. The Jar tests of Ferric chloride and Dipolarization-induced Electro-coagulation proc...

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Bibliographic Details
Main Authors: Yen-Min Chen, 陳彥旻
Other Authors: H.Paul Wang
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/66413608069886361858