Growth Mechanism of Microcrystalline Silicon Thin Films Deposited by ICPCVD
碩士 === 國立交通大學 === 材料科學與工程系 === 91 === In this study, growth mechanism of microcrystalline Si (uc-Si:H) thin film was investigated. It is desirable to understand the growth mechanism of uc-Si:H in order to improve device performances through microscopic network structure control of materials. The con...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/59075166667427877065 |