Atomic Dynamics of Hydrogen and Chlorine Coexistence on the Silicon Surface
碩士 === 國立交通大學 === 物理研究所 === 91 === In the Si-based semiconductor industry, SiH4, SiH2Cl2, SiHCl3 and SiCl4 are frequently used to grow silicon and SiO2 dielectric thin films. During the film growth, the H2, HCl and SiCl2 molecules are all among the desorption products at different tempera...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88224293209063872706 |