Study of Deep Depletion Phenomena in SrTiO3 High-k Gate Oxide and Its Application on the Ferroelectric Memory

碩士 === 國立交通大學 === 電子工程系 === 91 === SrTiO3 thin films were deposited on p-type silicon substrate by radio-frequency (rf) magnetron sputtering in an Ar-O2 and Ar-N2 mixed ambient to form metal/insulator/semiconductor (MIS) structure. We found that the Schottky emission and Fowler-Nordheim t...

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Bibliographic Details
Main Author: 陳柏仰
Other Authors: T. Y. Tseng
Format: Others
Language:en_US
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/69878017558641376753