Electromagnetic Wave Propagation in Nonuniform Plasma and Harmonic Generation
碩士 === 國立東華大學 === 電機工程學系 === 91 === There are some semiconductor manufacturing technology bottlenecks existing in the recently development for the device dimension shrinking. Photolithography is the one of those key challenges. Nowadays, photolithography uses ArF 193 nm wavelength laser sou...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25437435510497762997 |